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The colloidal domain : = where physi...

Wennerstr闣, H嶡an.

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The colloidal domain : = where physics, chemistry, biology, and technology meet /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	The colloidal domain :/ Fennell Evans and H嶡an Wennerstr闣.
Reminder of title:	where physics, chemistry, biology, and technology meet /
Author:	Evans, D. Fennell.
other author:	Wennerstr闣, H嶡an.
Published:	New York :Wiley-VCH, : c1999.,
Description:	xl, 632 p. :ill. ;26 cm.
Series:	Advances in interfacial engineering series.
Subject:	Colloids. -
Online resource:	http://www.loc.gov/catdir/bios/wiley041/98023227.htmlhttp://www.loc.gov/catdir/bios/wiley041/98023227.html
Online resource:	http://www.loc.gov/catdir/description/wiley032/98023227.htmlhttp://www.loc.gov/catdir/description/wiley032/98023227.html
Online resource:	http://www.loc.gov/catdir/toc/onix03/98023227.htmlhttp://www.loc.gov/catdir/toc/onix03/98023227.html
ISBN:	0471242470$b(hbk.):

The colloidal domain : = where physics, chemistry, biology, and technology meet /
Evans, D. Fennell.

The colloidal domain :where physics, chemistry, biology, and technology meet /Fennell Evans and H嶡an Wennerstr闣. - 2nd ed. - New York :Wiley-VCH,c1999. - xl, 632 p. :ill. ;26 cm. - Advances in interfacial engineering series..

Includes bibliographical references (p. xxxi) and index.

ISBN: 0471242470$b(hbk.):NT$4135

LCCN: 98023227Subjects--Topical Terms:

628908
Colloids.

LC Class. No.: QD549 / .E93 1999

Dewey Class. No.: 541.3/45

The colloidal domain : = where physics, chemistry, biology, and technology meet /
LDR:01146pam 2200229 a 450 001 630000
008 081117s1999 nyua b 001 0 eng
010 $a 98023227
020 $a 0471242470$b(hbk.): $c NT$4135
020 $a 9780471242475$b(hbk.)
035 $a 00476426
040 $a DLC $c DLC $d DLC
050 0 0 $a QD549 $b .E93 1999
082 0 0 $a 541.3/45 $2 21
100 $a Evans, D. Fennell. $3 628907
245 1 4 $a The colloidal domain : $b where physics, chemistry, biology, and technology meet / $c Fennell Evans and H嶡an Wennerstr闣.
250 $a 2nd ed.
260 $a New York : $c c1999. $b Wiley-VCH,
300 $a xl, 632 p. : $b ill. ; $c 26 cm.
440 0 $a Advances in interfacial engineering series.
504 $a Includes bibliographical references (p. xxxi) and index.
650 $a Colloids. $3 628908
650 $a Surface chemistry. $3 551428
700 $a Wennerstr闣, H嶡an. $3 628906
856 4 2 $3 Contributor biographical information $u http://www.loc.gov/catdir/bios/wiley041/98023227.html $z http://www.loc.gov/catdir/bios/wiley041/98023227.html
856 4 2 $3 Publisher description $u http://www.loc.gov/catdir/description/wiley032/98023227.html $z http://www.loc.gov/catdir/description/wiley032/98023227.html
856 4 $3 Table of Contents $u http://www.loc.gov/catdir/toc/onix03/98023227.html $z http://www.loc.gov/catdir/toc/onix03/98023227.html