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Modeling of chemical vapor depositio...
~
Werner, Christoph, (1949-)
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Modeling of chemical vapor deposition of tungsten films /
Record Type:
Language materials, printed : Monograph/item
Title/Author:
Modeling of chemical vapor deposition of tungsten films // Chris R. Kleijn, Christoph Werner.
Author:
Kleijn, Chris R.,
other author:
Werner, Christoph,
Published:
Basel ;Birkh醀user Verlag, : 1993.,
Description:
138 p. :ill. ;23 cm.
Series:
Progress in numerical simulation for microelectronics ;
Subject:
Semiconductor films - Mathematical models. -
ISBN:
0817628584 (Boston : acid-free paper)
Modeling of chemical vapor deposition of tungsten films /
Kleijn, Chris R.,1960-
Modeling of chemical vapor deposition of tungsten films /
Chris R. Kleijn, Christoph Werner. - Basel ;Birkh醀user Verlag,1993. - 138 p. :ill. ;23 cm. - Progress in numerical simulation for microelectronics ;vol. 2.
Includes bibliographical references.
ISBN: 0817628584 (Boston : acid-free paper)
LCCN: 92044681Subjects--Topical Terms:
663284
Semiconductor films
--Mathematical models.
LC Class. No.: TK7871.15.F5 / K53 1993
Dewey Class. No.: 621.3815/2
Modeling of chemical vapor deposition of tungsten films /
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Modeling of chemical vapor deposition of tungsten films /
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Chris R. Kleijn, Christoph Werner.
260
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Basel ;
$a
Boston :
$c
1993.
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Birkh醀user Verlag,
300
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138 p. :
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ill. ;
$c
23 cm.
440
0
$a
Progress in numerical simulation for microelectronics ;
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vol. 2
504
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Includes bibliographical references.
650
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Semiconductor films
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Mathematical models.
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663284
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Vapor-plating
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Mathematical models.
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663285
700
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Werner, Christoph,
$d
1949-
$3
663282
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六樓西文書區HC-Z(6F Western Language Books)
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Volume Number:
Items
1 records • Pages 1 •
1
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W0020379
六樓西文書區HC-Z(6F Western Language Books)
01.外借(書)_YB
一般圖書
TK7871.15.F5 K63 1993
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